This system is primarily used in fields such as integrated circuits and advanced packaging to provide mechanical support for wafers during the thinning process. It offers the advantages of a simple process and a relatively low bonding temperature, which significantly reduces the time needed for bonding.
| Bonding Temperature | RT~150℃ |
| Bonding Pressure | 10KN |
| Ultimate Vacuum | 100Pa |
| Alignment Accuracy | ≤100μm |