Automatic Vacuum Pressure Cleaning System

主要特点

This system is primarily used in fields such as integrated circuits and advanced packaging. It employs negative pressure alongside a wet cleaning process to remove flux from confined spaces. The advantages include high cleaning efficiency and suitability for narrow gaps between small bumps on large chips.

规格参数

Ultimate Vacuum5KPa
Spindle Speed≤3000rpm
Hot Plate TemperatureRT~120℃
WPH≥6