1. Suitable for advanced packaging, wafer fabrication, ICs, power electronics and RF applications.
2. The system supports multiple wafer sizes and features various chuck and pin configurations to accommodate different types of wafer.
3. The system has a small footprint, high throughput, and high levels of integration.
| Cleaning Capability | ≤10ea@0.12μm |
| High Pressure | ≤23MPa |
| WPH | 200 |
| Resistance Value | 0.2±0.1MΩ.cm |