Automatic High Pressure Cleaning System

主要特点

1. Suitable for advanced packaging, wafer fabrication, ICs, power electronics and RF applications.

2. The system supports multiple wafer sizes and features various chuck and pin configurations to accommodate different types of wafer.

3. The system has a small footprint, high throughput, and high levels of integration.

规格参数

Cleaning Capability≤10ea@0.12μm
High Pressure≤23MPa
WPH200
Resistance Value0.2±0.1MΩ.cm