This system is primarily used in the field of semiconductor power devices. It integrates glass cleaning and coating functions into a single unit, and its greatest advantage is that the glass can be reused, saving costs.
| Number of Repeated Uses of Glass | ≥30 |
| Coating Rotation Speed | ≤3000rpm |
| Hot Plate Temperature | 50~250℃ |
| WPH | ≥25 |