Automatic Wafer Coating System

主要特点

This system is capable of coating and developing wafers and is suitable for processes such as G-line and I-line. It primarily consists of a transport module, a process module, a heating and cooling module, a fluid supply module and an electrical control module. The standard configuration includes four process chambers. The number of process chambers and heating and cooling plates, as well as the front- and back-side cleaning functions, can be customized according to customer requirements.

规格参数

Applicable Products8/12 inches
Gluing Rotation Speed≤6000rpm
Applicable Viscosity of Glue Pump≤20000CP
Alignment Accuracy≤100μm